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In-Process Evaluation

Wafer manufacturing process

Array Spectrometer MCPD-9800

Multipurpose spectrometer covering UV to NIR wavelength range. Shortest integration time is 5ms. Using optical fiber, various measurement optics can be configured for versatile application, including micro spot spectrum, light source, transmittance, reflectance, object color and thickness measurement.

FPD evaluation process

LCD Cell Gap Measurement RETS series

Cell gap measurement for LCD cell (Reflection type & Transmission type) and empty cell with color filter

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency

Color Filter Spectral Inspection System LCF series

Can be used for various evaluations in FPD manufacturing process, including optical-property analysis for color filters and thin-film analysis for films on glass substrates.

LED evaluation process

High-speed LED Spectrometer LE series

Inline evaluation system for optical characteristics of LED synchronized with control signal in production line. LE-5400 provides the optical characteristics data which are required for quality control such as OK/NG judgement and LED binning.

Wafer manufacturing process

Si Wafer Thickness Monitoring System SF-3

Real-time measurement of Si wafer thickness at CMP or BG

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency

Film formation process

Si Wafer Thickness Monitoring System SF-3

Real-time measurement of Si wafer thickness at CMP or BG

Retardation film and material evaluation system RETS-100

Perfect for evaluation of polarization characteristics of optical film- evaluation of wavelength dispersion of retardation and automatic detection of the orientation angle (optical axis) and the rubbing angle.

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency