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Particle Size Analyzer
Zeta-potential and Particle Size AnalyzerELSZneo
Features
- Particle size and zeta potential measurement in a wide concentration range from diluted to concentrated solution (~ 40%)
- Multi-angle measurement to carry out particle size distribution with higher separability
- Zeta potential measurement of solid surface in high salt concentration
- Particle concentration analysis using Static Light Scattering
- Microrheology measurement using Dynamic Light Scattering
- Gel network and gel heterogeneity analysis by measuring intensity of scattered light and diffusion coefficient of sample at multiple points
- Standard flow cell which can be used for two types of measurement (Particle size and zeta potential) without replacing samples
- Wide range of measurement temperature from０to 90℃
- Temperature gradient function which enables denaturation (melting temperature) analysis for proteins
- Electrophoretic mobility measurement and plot analysis for accurate zeta potential measurement
- Band-pass filter (option)
Measurement Items
- Zeta Potential
- Particle Size
- Molecular Weight
- Multi-Angle Measurement
- Particle Concentration
- Microrheology
Measurement Range
- Particle Size : 0.6 nm to 10 μm
- Zeta Potential : No effective upper limit
- Molecular Weight : 340 to 2 × 107
- Electrophoretic Mobility : -2 × 10⁻⁵ to 2 × 10⁻⁵ cm²/V·s
Applicable Range
- Measurement Temperature Range : 0 to 90°C
- Measurement Concentration Range : Zeta Potential: 0.001 to 40%
- Measurement Concentration Range : Particle Size: 0.00001% (0.1 ppm) to 40%*¹
Multi-Sample Nanoparticle Size Measurement SystemnanoSAQLA
Features
- Simple and quick one-time setup of up to 5 samples each under different conditions.
- Measures both dilute and highly concentrated samples
- Measures in approximately 1 min +
- Includes temperature gradient function
- Contamination-free continuous measurement
- Up to 50 samples in a row
- Add samples as measure
- Set samples in place easily
- Replace up to 50 samples at once
- For organic solvents (Glass disposable cell)
- Sample vol. 0.4 ml ~
Measurement Performance
- Continuous Measurement Up to 5 Samples
- Measurement Range 0.6 nm to 10 μm
- Concentration Range 0.00001 (0.1 ppm) to 40%*1
- Temperature Range 0 to 90°C (with temperature gradient function)*2
Dynamic Light Scattering SpectrophotometerDLS-8000 series
Features
- Measures particle size and particle-size distribution based on the dynamic light-scattering method, and absolute molecular weight, radius of gyration, and the second viral coefficient based on the static light-scattering method.
- He-Ne laser, Ar laser, double laser (He-Ne, Ar) models are available.
- Adopts a liquid-immersion optical system, supporting high precision measurement for extremely weak scattering of nano order particles.
- Supports multimode analysis of concentrated polymer solutions, using a correlator providing up to 4,096 channels.
- Supports gel-state analysis in combination with the optional gel rotation cell.
Measurement Targets
- Synthetic Polymer
- Bio polymer
- Inorganic material
Measurement Items
- Particle sizing range
- Translation diffusion coefficient
- Molecular weight measurement range
- Radius of gyration
- Second virial coefficient
Polymer Phase Structure Analyzer PP-1000
Features
- Measures scattering angle of 0.33 to 45 degrees in 10 msec at the fastest*
- Evaluates structures of submicron to several hundred micron size
- Measures solution samples with specialized cells
- Allows user to easily switch between Hv and Vv scattering with software
- Can be set up in labs because it is a table-top type
Separation Analysis Instrument
Capillary Electrophoresis SystemAgilent7100
Features
- Excellent technical support with a wealth of applications such as buffer manuals
- This single system can analyze mixtures including cations and anions
- Even if sample is a limited amount, it can be analyzed with high speed and resolution
- 3 to 5 times higher sensitivity without loss of resolution using ` bubble cell capillary`
- In most cases pretreatment is unnecessary even in the presence of counter-ions and/or contaminations
- Economical and environmentally friendly because no expensive columns and/or solvents are used
Spectroscopic Characterization Instrument
Array SpectrometerMCPD-9800/6800 series
Features
- Choose best suitable model on your need
- USB and LAN as communication interface
- High speed and high sensitivity spectrum acquisition
- Flexible optics configured with optical fiber.
Measurement Items
- Transmission/Absorption Spectrum
- Reflection Spectrum
- Object Color
- Light Source Color
- Film Thickness
Total Luminous Flux Measurement SystemHM/FM Series
Features
- Accommodates Maximum 2400mm fluorescent tube
- ESNA LM79 and LM-80 compliant
- Wide dynamic range thanks to high performance array spectrometer
- Wide sphere diameter range between φ250 mm and φ3,000 mm
- L-I-V, Pulse, PWM, Tem. Control (-40 c to+200 c) measurement are available
- PWM (Pulse Width Modulation) applicable
Measurement Items
- Total luminous flux
- Total radiant flux
- SDCM
- Chromaticity
- Other
LCD Cell Gap MeasurementRETS series
Features
- Polarization Optical System and Array Spectrometer
- Measures various size of samples (from 1mm optical element to 10th generation large LCD panels)
- Complying LCD production requirement for safety measure and dust prevention
Measurement Targets
- LCD Cell
- Optical Material
Measurement Items
- Filled cell gap
- Twist angle
- Rubbing angle
- Pretilt angle
- Empty cell gap
- Retardation dispersion
- Optical axis
- Ellipticity/ Azimuth angle
- Three-dimensional refractive index
- Spectrum / chromaticity
High-speed LED SpectrometerLE series
Features
- Synchronized with control signal in production line
- Flexible/various measurement system with optical fiber
- High speed test – short exposure time (Min. 2ms/ LE-5400)
- High speed measuring cycle -test/calculation/evaluation (Half a time compared with conventional model)
Measurement Items
- Tristimulus value
- Chromaticity
- Other
Goniophotometric Measurement SystemGP series
Features
- Goniophotometric measurement for LED luminaries up to 2400 mm.
- Spectral distribution at each angle by controlling two-axis goniophotometer automatically to obtain total luminous flux with zonal spherical function.
- Goniophotometric measurement for large displays.
- Wide dynamic range with brand-new detector.
- Complying with IESNA LM-75 and CIE121
- Usable for both Type B and Type C.
- Goniophotometric measurement at both UV and NIR region (Spectral radiant flux calculation available)
Measurement Items
- Angular distribution
- Spectral radiant flux
- Chromaticity
- Other
Color Filter Spectral Inspection SystemLCF series
Features
- Provides comprehensive inspection capabilities for color filter manufacturing processes, including transmission spectrum measurement, color measurement, concentration measurement, film-thickness measurement, and reflection spectrum measurement.
- Suitable for a variety of evaluation applications, including optical-property evaluation of color filters and thin-film analysis of films on glass substrates.
- The autofocus function and automatic pixel alignment capability enable highly accurate measurements and support fully automated inspection through recipe registration.
Measurement Targets
- R
- G
- B
- ITO
- PI
- Principle
- OC
- BM
Measurement Items
- Color Filter Evaluation
- Thickness Measurement
High speed retardation measurement systemRE-200
Features
- Low (residual) retardation measurement from 0 nm
- High-speed retardation (Re.) measurement and optical axis simultaneous detection
- （Processing in less than 0.1 seconds, the fastest in the world）
- High repeatability due to no drive
- Easy to measure with few parameters to set
- Various wavelengths other than 550 nm are available
- Rth measurement and omni azimuthal measurement are available
- （Requires optional auto-rotating tilt unit)
- Combined with a tensile tester, it is possible to evaluate the photoelasticity simultaneously with the polarization characteristics of the film
- (This system is custom made.）
Measurement Targets
- Optical film
- retardation film
- ellipsoidal film
- retardation plate
- polarizing film
- function added polarizing film
Measurement Items
- Retardation（ρ[deg.], Re[nm]）
- Principal axis azimuth（θ[deg.]）
- Ellipticity（ε）/Azimuth（γ）
- 3D refractive index（NxNyNz）
Retardation Film Inspection SystemRETS-100nx
Features
- High-precision measurement due to our original spectrometer
- Extremely high retardation measurement -Super Retardation Film can be measured with high speed and high precision-
- Multi-layered film measurement -Lamination state of various films can be measured non-destructive without peeling-
- Correction function for axis direction -Easy and reproducible measurement even if sample is misaligned-
- Simple software -Measurement time and processing time are greatly reduced. Greatly improved operability-
Film Thickness Measurement Instrument
Optical Thickness MeterOPTM Series
Features
- All functions necessary for film thickness measurements are integrated in the head
- Highly accurate absolute reflectance measurement using microspectroscopy (thickness of multilayered film and optical constants)
- High speed measurement of less than 1 second per point
- An optical system which makes possible measurement with a wide wavelength range (UV to NIR) using microscopy
- Safety mechanism with area sensors
- Easy Analysis Wizard which allows anyone- even untrained operators, to carry out the analysis of optical constants without difficulty
- Software program includes macro functions for customization of the measurement sequence
- Various customizations are possible
- Complex optical constants can also be analyzed(multi-point analysis)
- 300 mm stage available
Measurement Applications
- Semiconductors
- Films
- Solar Cells
- DLC
- FPD
- Optical Components
Measurement Examples
- Oxide Films
- Nitride Films
- Photoresists
- AR Coatings
- Perovskite Films
- Various Optical Thin Films
Measurement Items
- Absolute Reflectance
- Film Thickness Analysis
- Optical Constants Analysis (n: Refractive Index, k: Extinction Coefficient)
Thickness MonitorFE-300
Features
- Wide film thickness range （1nm～1mm)
- Thickness measurement using reflection spectrum
- Compact and affordable without compromising high precision
- User friendly software interface.
- Analytical algorisms are Peak-Valley Method, Fast Fourier Transformation (FFT) Method, Non-linear Least-Squares Method and Optimization Method.
- Optical constant analysis (n: Refractive index, k: Extinction coefficient) with Non-linear Least-Squares Method
Measurement Targets
- Function film, Plastic
- Semiconductor, Compound semiconductor
- Surface treatment
- Optical materia
- FPD
- Others
Measurement Items
- Absolute reflectance
- Film thickness(Up to 10 layers)
- Optical constant(n: Refractive index, k: Extinction coefficient)
Spectrum EllipsometerFE-5000 series
Features
- Ellipsometry measurement for both visible and ultraviolet-ray range (250 to 800nm)
- Nano-order thin film thickness
- Quick measurement using multi channel spectroscopy (over 400 ch)
- Angle adjustable mechanism for detailed analysis
- High operability with optical constant database and recipe registration function
Measurement Targets
- Semiconductor wafer
- Compound semiconductor
- FPD （flat panel display）
- New materials
- Optical thin films
- Lithography
Measurement Items
- Ellipso-parameters
- Optical constant analysis
- Thickness analysis
Si Wafer Thickness Monitoring SystemSF-3
Features
- Non contact, non destructive measurement
- Parameter setting after spectrum analysis
- High speed real-time monitoring during CMP, BG
- Measurement over interlayer such as protection film and window material
- Multi layers analysis
- Original analytical engine (Patent pending)
- Original analytical algorism for thickness measurement (Patented)
- Automatic mapping function for thickness distribution
Measurement Targets
- Thickness measurement for Si wafer material
- Grinding evaluation for silicon/ compound semiconductor
- 1.3 mm / next generation 450 mm wafer
- 775 ㎛ 300 mm wafer
- TSV wafer (Si layer thickness measurement on via)
- Other materials (SiO2, film)
Measurement Items
- Film thickness analysis (5 layers)
Built-in film thickness monitorFE-3
Features
- A film thickness measurement system based on the high precision spectral interferometry
- Fast Fourier Transformation (FFT) Method as an analytical algorithm (Patent No: 4834847)
- Variety of measurement optics using optical fiber
- Integratable for a wide variety of manufacturing equipments
- Real time thickness measurement
- Remote control and multi point measurement
- White LED light source - long life and high stability
Measurement Targets
- Optic film (Hard Coat, AR film, ITO…etc)
- FPD (resist, SOI, SiO2…etc)
Measurement Items
- Film thickness analysis for multi-layer film
Line-Scan Thickness Monitor™ In-line Type
Features
- Line scan method enables full-width and full-length film inspection without ` omission`
- Original design of both hardware and software
- As a manufacturer specializing in film thickness measurement, we can provide enriched support
- High precision measurement is possible (patented)
- High speed measurement is possible
- Resistant to fluttering
- Wide sample width (up to 10 m in the transverse direction)
Measurement Object
- Film Substrates
- Thin-Film Coatings on Films (AR, ITO, HC, etc.)
- Glass
- Functional Materials
- Medical Materials
Measurement Items
- Film Thickness (2D Map, MD and TD Trends)
Examples of Detectable Defects
- MD Streaks
- Cross-Web Bands
- Diagonal Non-Uniformities
- Chuck Marks
- Spot Defects
Three-Dimensional Microscope
Three-Dimensional Optical Wave Field MicroscopeMINUK
Features
- Evaluating transparent foreign substances and defects in the nano-order．
- Obtaining instant depth direction information in single shot.
- High-speed measurement without focus.
- Non-destructive, non-contact and non-invasive measurement.
- Easy to find the required location by scanning rough position around the target at high-speed, without focus.
Examples
- Films
- Optical Waveguides
- Cells
- Glass
- Gels
- Protein Aggregates
Detection Targets
- Scratches
- Voids
- Core Structures
- Fillers
- Cell Morphologies
- Refractive Index Variations
Observation Modes
- OPD
- Bright Field
- Amplitude
- OPD Edge
- Edge
- Differential
