Home > Product:Spectrometry > In-Process Evaluation

In-Process Evaluation

Wafer manufacturing process

Array Spectrometer MCPD-9800

Multipurpose spectrometer covering UV to NIR wavelength range. Shortest integration time is 5ms. Using optical fiber, various measurement optics can be configured for versatile application, including micro spot spectrum, light source, transmittance, reflectance, object color and thickness measurement.

FPD evaluation process

LCD Cell Gap Measurement RETS series

Cell gap measurement for LCD cell (Reflection type & Transmission type) and empty cell with color filter

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency

Color Filter Spectral Inspection System LCF series

Can be used for various evaluations in FPD manufacturing process, including optical-property analysis for color filters and thin-film analysis for films on glass substrates.

Retardation Film Inspection System RETS-100nx New

RETS-100nx is a retardation measuring system for all kinds of films such as OLED polarizing plate, laminated retardation film and polarizing plate with retardation film for IPS liquid crystal.
Extremely high retardation as 60,000 nm can be measured with high speed and high precision.
Lamination state of film can be measured "non-destructive without peeling".
Furthermore, on the operation, simple software and a correction function that copes with misalignment due to sample re-placement are installed. High-precision measurement can be easy to use.

LED evaluation process

High-speed LED Spectrometer LE series

Inline evaluation system for optical characteristics of LED synchronized with control signal in production line. LE-5400 provides the optical characteristics data which are required for quality control such as OK/NG judgement and LED binning.

Wafer manufacturing process

Si Wafer Thickness Monitoring System SF-3

Real-time measurement of Si wafer thickness at CMP or BG

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency

Film formation process

Si Wafer Thickness Monitoring System SF-3

Real-time measurement of Si wafer thickness at CMP or BG

Built-in film thickness monitor FE-3

Accurate multi-layer film thickness measurement which has characteristics of wavelength dependency

High speed retardation measurement system RE-200

High quality control of Optical axis! 3σ≦0.02°
for low retardation measurement

Retardation Film Inspection System RETS-100nx New

RETS-100nx is a retardation measuring system for all kinds of films such as OLED polarizing plate, laminated retardation film and polarizing plate with retardation film for IPS liquid crystal.
Extremely high retardation as 60,000 nm can be measured with high speed and high precision.
Lamination state of film can be measured "non-destructive without peeling".
Furthermore, on the operation, simple software and a correction function that copes with misalignment due to sample re-placement are installed. High-precision measurement can be easy to use.

Page Top