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Material Evaluation

Film evaluation

Optical Thickness Meter OPTM series

This instrument enables extremely precise analysis of film thickness and optical constants by measuring absolute spectral reflectance of microscopic regions.
Non-destructive and non-contact thickness measurement can be carried out on multilayered films and various coating layers including films, wafers, and optical materials.
Measurement speed is as fast as 1 second / point. Software is easy to use even for beginner users analyzing optical constants.
 

Line-Scan Thickness Monitor (In-line type) New

This in-line monitor can measure film thicknesses across the full-width and full-length of film products during manufacturing.
By combining our unique spectral interference technology with our newly developed high-precision film thickness processing technology, a single monitor can measure film thicknesses as wide as 500 mm in the shortest interval of 0.01 seconds

Line-Scan Thickness Monitor (Off-line type)

This off-line monitor easily inspects film thickness unevenness ‘mura’ of the entire area of film for use in R&D and sampling inspection of production lines.
Entire area of film can be measured at high speed and with great precision.

High speed retardation measurement system RE-200

High quality control of Optical axis! 3σ≦0.02°
for low retardation measurement

Retardation Film Inspection System RETS-100nx New

RETS-100nx is a retardation measuring system for all kinds of films such as OLED polarizing plate, laminated retardation film and polarizing plate with retardation film for IPS liquid crystal.
Extremely high retardation as 60,000 nm can be measured with high speed and high precision.
Lamination state of film can be measured "non-destructive without peeling".
Furthermore, on the operation, simple software and a correction function that copes with misalignment due to sample re-placement are installed. High-precision measurement can be easy to use.

Thickness Monitor FE-300

A film thickness measurement system based on the high precision spectrophotometry features compact size and affordable price. Every necessary component is built in one body for stable measurement data. Although offered at affordable price, there is no compromise on accuracy and even optical constant analysis is possible.

Fluorescence

Quantum Efficiency Measurement System QE-2000

High accurate and instant absolute quantum efficiency measurement is possible for powder, solution and solid sample. Stray light effect in UV wavelength region is substantially eliminated. Further, high sensitivity is achieved thanks to integrating hemisphere as detector, and re-excitation elimination function enables to obtain “True property” of phosphor characteristics.

High Sensitivity NIR Quantum Efficiency Measurement System QE-5000

Detecting singlet oxygen (Reactive Oxygen Species(ROS))

Thickness meters

Optical Thickness Meter OPTM series

This instrument enables extremely precise analysis of film thickness and optical constants by measuring absolute spectral reflectance of microscopic regions.
Non-destructive and non-contact thickness measurement can be carried out on multilayered films and various coating layers including films, wafers, and optical materials.
Measurement speed is as fast as 1 second / point. Software is easy to use even for beginner users analyzing optical constants.
 

Contact-Free Thickness Meter Emios

This meter pursues user-friendliness in an uncomplicated manner with “one step operation” such as just placing a sample on the tray for quick analysis.

This meter aims to streamline the inspection process by easily measuring absolute thickness without a calibration curve, with high precision and with high resolution.

Due to our unique optical geometry being designed as compact, this meter carries out non-contact measurement with high precision of even opaque, rough surface and/or flexible samples.

Line-Scan Thickness Monitor (In-line type) New

This in-line monitor can measure film thicknesses across the full-width and full-length of film products during manufacturing.
By combining our unique spectral interference technology with our newly developed high-precision film thickness processing technology, a single monitor can measure film thicknesses as wide as 500 mm in the shortest interval of 0.01 seconds

Line-Scan Thickness Monitor (Off-line type)

This off-line monitor easily inspects film thickness unevenness ‘mura’ of the entire area of film for use in R&D and sampling inspection of production lines.
Entire area of film can be measured at high speed and with great precision.

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